| 摘要 |
<p>The invention relates to device (1) for heating a substrate (12) according to a predetermined temperature profile for crystallizing a material on the substrate comprising: a housing (2), at least a process chamber (3) which is situated inside the housing and which is provided with a first and second opening (6,7) for passing through a substrate, an inlet (17) for introducing a process gas which comprises the material in a vapour phase into the first process chamber, at least two transport rollers (15) for transporting the substrate into the process chamber (3), wherein the transport rollers are attached to the housing (2) so as to be rotatable. The device is furthermore provided with passage spaces (20,25) for preventing the escape of process gas from the process chamber to a space between the process chamber (3) and the housing (2), which are situated near respective ends of the transport rollers (15) in the process chamber (3), wherein the respective passage spaces (20) are provided with a first passage opening (21) on an inner wall (23) of the process chamber (3), a second passage opening (22) on an outer wall (24) of the process chamber (3) and a first flange (25) which is fixed around the transport roller (15).</p> |
