发明名称 POLYSILOXANE-BASED COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a polysiloxane-based composition which has high heat resistance and light resistance, is excellent in gas barrier property and thermal shock resistance, and has good handleability when an optical semiconductor element is sealed. <P>SOLUTION: The polysiloxane-based composition comprises (A) a polysiloxane modified product having a polyhedral structure, which is obtained by hydrosilylation of (b) a polysiloxane compound obtained by hydrosilylation of (a) polysiloxane-based compounds each having a polyhedral structure and containing an alkenyl group and a hydrosilyl group, (c) a compound having two or more hydrosilyl groups or alkenyl groups within one molecule, and (d) an organosilicon compound having a hydrosilyl group or an alkenyl group within one molecule; and (B) a triazine-based organic compound. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013060556(A) 申请公布日期 2013.04.04
申请号 JP20110201059 申请日期 2011.09.14
申请人 KANEKA CORP 发明人 TANAKA HIROYUKI;SUGIYAMA TOMOHITO;MANABE TAKAO
分类号 C08L83/14;C08G77/50;C08K5/3477;H01L23/29;H01L23/31 主分类号 C08L83/14
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