IMMERSION LITHOGRAPHY APPARATUS, SHUTTER MEMBER, AND SUBSTRATE TABLE

摘要

PROBLEM TO BE SOLVED: To increase lyophobic properties of a surface of an immersion lithography apparatus.

SOLUTION: An immersion lithography apparatus comprises a surface contacted by immersion liquid when used, and the surface has surface roughness of 0.2 μm or less. The immersion liquid on the surface may have a contact angle of 60° or more. The surface may maintain a characteristic of the surface so that the immersion liquid on the surface has the contact angle enabling immersion for a long period of time in the immersion liquid.

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