DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME

摘要

PURPOSE: A display device and a manufacturing method thereof are provided to form a double layered gate line in a dual link structure for a narrow bezel and to prevent damage to a gate line. CONSTITUTION: A thin film transistor is formed in a pixel portion of a first substrate. A first link line and a gate line(216,216') are formed. A second link line(226b) is formed on the first substrate. A passivation film(215b) is formed on the first substrate. The first substrate is attached to a second substrate(210). A conductive layer is formed on the first link line and the gate line. The conductive layer is not reacted to a dry etching process.