| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an antireflection film which has near infrared ray absorption performance and antireflection performance, which is excellent in scuffing resistance and an antistatic property, constitution of whose layers is simplified and which is suitable, particularly, for a PDP (a plasma display panel) and is produced at a low cost by a wet process. <P>SOLUTION: The antireflection film is produced by successively laminating a resin layer (A) which has electro-conductivity and thickness of 50 to 500 nm, a hard coat layer (B) which contains a resin to be cured by irradiation with an active energy ray and a near infrared ray absorbing agent and has 2 to 20 μm thickness, and a low-refractive index layer (C) which contains the resin to be cured by irradiation with the active energy ray and has a refractive index of ≤1.43 and 50 to 200 nm thickness, on one side of a base material film. Further in the antireflection film, spectral transmittance in the whole area of light having 800 to 1,200 nm wavelength is ≤30% at the least. <P>COPYRIGHT: (C)2008,JPO&INPIT |
