| 摘要 |
<p>PURPOSE: A thin film processing apparatus is provided to improve particle removal efficiency by securing sufficient particle inhalation. CONSTITUTION: A substrate transfer unit(500) transfers a substrate(10) in X, Y, and Z directions. A laser irradiating unit(100) irradiates laser beam to a boundary between the substrate and particles(14). An inhalation unit(200) inhales particles from the substrate. A support member(300) restricts the movement of the substrate by the inhalation force of the inhalation unit. A sensor unit(400) senses the substrate which is closely adhered to the support member.</p> |
