PHOTOACTIVE COMPOUND AND A LIGHT-SENSITIVE RESIN COMPOSITION COMPRISING SAME

摘要

The present invention relates to a photoactive compound having a novel structure and to a light-sensitive resin composition comprising same. The photoactive compound according to the present invention not only has outstanding sensitivity because of effective absorption with respect to a UV light source due to the inclusion of a nitro group and phosphonate structure, but also has outstanding residual film thickness, mechanical strength, heat resistance, chemical resistance and development resistance due to improved solubility of the light-sensitive resin composition because of outstanding compatibility of the phosphonate structure and a binder resin. Consequently, the light-sensitive resin composition of the present invention is not only advantageous in the curing of liquid-crystal-display column spacers, overcoats, passivation materials and the like but is also advantageous in terms of high-temperature processing characteristics as well.