发明名称 |
LOADLOCK BATCH OZONE CURE |
摘要 |
<p>A substrate processing chamber for processing a plurality of wafers in batch mode. In one embodiment the chamber includes a vertically aligned housing having first and second processing areas separated by an internal divider, the first processing area positioned directly over the second processing area; a multi-zone heater operatively coupled to the housing to heat the first and second processing areas independent of each other; a wafer transport adapted to hold a plurality of wafers within the processing chamber and move vertically between the first and second processing areas; a gas distribution system adapted to introduce ozone into the second area and steam into the first processing area; and a gas exhaust system configured to exhaust gases introduced into the first and second processing areas.</p> |
申请公布号 |
SG185588(A1) |
申请公布日期 |
2012.12.28 |
申请号 |
SG20120084133 |
申请日期 |
2011.06.16 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
LUBOMIRSKY, DMITRY;PINSON II, JAY D.;FLOYD, KIRBY H.;KHAN, ADIB;VENKATARAMAN, SHANKAR |
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