发明名称 METHOD AND APPARATUS FOR THERMOCOUPLE INSTALLATION OR REPLACEMENT IN A SUBSTRATE SUPPORT
摘要 An apparatus and method for one or more externally mounted temperature sensors in a substrate support utilized in a chemical vapor deposition (CVD) chamber is provided. In one embodiment, a substrate support for a vacuum chamber is provided. The substrate support comprises a body having a substrate receiving surface and an opposing bottom surface, a support stem coupled to and extending away from the bottom surface, one or more thermal control devices embedded within the body, at least one temperature sensor interfaced with the bottom surface of the body, and a removable hermitic enclosure fastened to the second side of the body and covering the at least one temperature sensor.
申请公布号 US2012241089(A1) 申请公布日期 2012.09.27
申请号 US201213360219 申请日期 2012.01.27
申请人 DIELMANN JOERG;RUEDIGER REINER;APPLIED MATERIALS, INC. 发明人 DIELMANN JOERG;RUEDIGER REINER
分类号 B44C1/22;B05C11/00;B05C13/00;B23P19/00 主分类号 B44C1/22
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