HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERNS

摘要

PURPOSE: A hard mask composition, a method for forming patterns using the same, and a semiconductor integrated circuit device including the patterns are provided to improve optical characteristic and to secure resistance to multiple etching. CONSTITUTION: A hard mask composition includes an aromatic ring containing compound and a solvent, and the aromatic ring containing compound includes a structural unit represented by chemical formula 1. In chemical formula 1, L is a single bond, a substituted or non-substituted C1 to C20 alkylene group, a substituted or non-substituted C6 to C30 arylene group, or the combination of the same; m is more than or equal to 1 and is less than 100; and either A1 or A2 is a substituent group which is represented by chemical formula 2. In chemical formula 2, R1 to R10 are respectively substituted or non-substituted C1 to C20 alkyl groups, substituted or non-substituted C3 to C30 cycloalkyl groups, substituted or non-substituted C6 to C30 aryl groups, substituted or non-substituted C3 to C30 cycloalkenyl groups, substituted or non-substituted C7 to C20 arylalkyl groups, substituted or non-substituted C1 to C20 heteroalkyl groups, substituted or non-substituted C2 to C30 heterocycloalkyl groups, substituted or non-substituted C2 to C30 heteroaryl groups, substituted or non-substituted C2 to C30 alkenyl groups, substituted or non-substituted C2 to C30 alkynyl groups, substituted or non-substituted C1 to C30 alkoxy groups, or the combination of the same; X1 to X10 are respectively hydrogen elements, hydroxyl groups, substituted or non-substituted C1 to C30 alkoxy groups, substituted or non-substituted C1 to C20 alkylamine groups, substituted or non-substituted amino groups, or the combination of the same; and n1 to n9 are 0 or 1.