发明名称 |
METHOD FOR MANUFACTURING PATTERNED MAGNETIC RECORDING DISK |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a patterned magnetic recording disk, which enables enlargement of an imprint resist feature size. <P>SOLUTION: The method comprises enlarging the size of imprint resist features after the imprint resist has been patterned by NIL (nanoimprint lithography). A layer of an imprint resist material is deposited on a blank disk, and the imprint resist layer is patterned by NIL, resulting in a plurality of spaced-apart resist pillars with sloped sidewalls from the top to the base. A coating layer is deposited over the patterned resist layer including over the sloped resist pillar sidewalls. The coating layer is then etched to leave the coating layer on the sloped resist pillar sidewalls while exposing the blank disk in the spaces between the resist pillars. The resist pillars are then used as a mask for etching the blank disk, leaving a plurality of discrete islands on the blank disk. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012119051(A) |
申请公布日期 |
2012.06.21 |
申请号 |
JP20110253022 |
申请日期 |
2011.11.18 |
申请人 |
HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS BV |
发明人 |
HIRANO TOSHIKI;DAN SAILOR KERCHER;JEFFREY S LILY;KANHAIYALAL CHATERDAS PATER |
分类号 |
G11B5/84;B29C59/02;G11B5/65;G11B5/855;H01L21/027 |
主分类号 |
G11B5/84 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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