发明名称 WAFER ALIGNING APPARATUS
摘要 <p>PURPOSE: A wafer aligning device is provided to prevent a wafer from sliding by downwardly tilting the upper side of a chuck pad included in a rotating unit to suppress the influence of a centrifugal force. CONSTITUTION: A rotating unit(200) is mounted on the upper side of a housing(100). A chuck pad(220) is tilted from the end to the center of an end of a wing in the rotating unit. A receiving unit(300) is mounted on the upper side of the rotating unit. A detection sensor(400) is mounted on the bottom of the upper surface of the housing with a preset height. A cylinder(600) is mounted in the housing.</p>
申请公布号 KR20120065678(A) 申请公布日期 2012.06.21
申请号 KR20100126933 申请日期 2010.12.13
申请人 CYMECHS INC. 发明人 KANG, JAE HO;PARK, SE UN
分类号 H01L21/68;H01L21/677;H01L21/683 主分类号 H01L21/68
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