| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device capable of cleaning a configuration member of an exposure device and starting exposure without deteriorating the exposure performance of the exposure device. <P>SOLUTION: In a cleaning method for cleaning a configuration member that constitutes the exposure device and comes into contact with the immersion liquid in an exposure device that exposes a substrate through immersion liquid, the configuration member is cleaned using cleaning fluid, and the cleaning fluid is washed in a state where the liquid level of cleaning fluid in the cleaning fluid is higher than the liquid level of rinsing liquid using the rinsing liquid. <P>COPYRIGHT: (C)2012,JPO&INPIT |
