发明名称 EXPOSURE METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 <p>Positional information of a stage is obtained using an interferometer system only during an exposure time when a constant speed drive of the stage is performed to form a pattern. Therefore, the linear measurement of the positional information is secured enough, which makes it possible to linearly drive the stage with high accuracy. Meanwhile, between an acceleration time and a deceleration time in which a step drive is performed, the positional information of the stage is obtained using an encoder system and a surface position measurement system. Therefore, measurement reproducibility of the positional information is sufficiently secured by the mechanical stability of a diffraction grating, which makes it possible to drive the stage precisely to the starting position of the constant speed drive.</p>
申请公布号 KR20120044927(A) 申请公布日期 2012.05.08
申请号 KR20117026982 申请日期 2010.08.24
申请人 NIKON CORPORATION 发明人 SHIBAZAKI YUICHI
分类号 G03F7/20 主分类号 G03F7/20
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