发明名称 CLUSTER DEPOSITION APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a cluster deposition apparatus that further increases the intensity of a cluster beam and also properly deposit a cluster on a substrate to effectively use the cluster. <P>SOLUTION: The cluster deposition apparatus includes: a laser device for radiating a laser beam on an evaporation surface of a target so as to generate the cluster by evaporating the target T; a cluster generation body 12 having a cluster generation chamber 31 for trapping the generated cluster; and a holder 13 for holding the substrate S so that a deposition surface of the substrate faces the inside of the cluster generation chamber. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012062540(A) 申请公布日期 2012.03.29
申请号 JP20100208709 申请日期 2010.09.17
申请人 HITACHI ZOSEN CORP 发明人 TAKITANI TOSHIO
分类号 C23C14/28 主分类号 C23C14/28
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