发明名称 DIFFUSION AGENT COMPOSITION AND METHOD OF FORMING IMPURITY DIFFUSION LAYER
摘要 <P>PROBLEM TO BE SOLVED: To improve electrical characteristics furthermore when an impurity diffusion layer is formed in a semiconductor substrate used in a solar cell or the like. <P>SOLUTION: A diffusion agent composition which is used for printing a dopant component onto a semiconductor substrate contains a silicon nitride (A), a dopant component (B), and a non-dopant metal component (C). Among these components, content of Na which is contained as the non-dopant metal component (C) is under 60 ppb for the whole composition. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012019162(A) 申请公布日期 2012.01.26
申请号 JP20100157167 申请日期 2010.07.09
申请人 TOKYO OHKA KOGYO CO LTD 发明人 MORITA TOSHIRO;KAMIZONO TAKASHI;MIYAGI TADASHI
分类号 H01L21/225;H01L31/04 主分类号 H01L21/225
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