| 摘要 |
<P>PROBLEM TO BE SOLVED: To adjust the amount of resin flow which depends on the direction when resin is used for formation of a sealing film. <P>SOLUTION: Liquid resin 38 is provided on a substrate 10 having an organic film 12 formed thereon to cover the organic film 12. The substrate 10 has a stopper pattern 14 which surrounds the organic film 12 with no gap 32 and stops flow of the resin 38, and a control pattern 16 arranged between the stopper pattern 14 and the organic film 12 in order to control flow of the resin 38. The control pattern 16 includes a first control pattern 22 and a second control pattern 24, where the first control pattern 22 is arranged closer to the organic film 12 than the second control pattern 24. The second control pattern 24 has a higher resistance against flow of the resin 38 in the direction of the stopper pattern 14 than that of the first control pattern 22. <P>COPYRIGHT: (C)2012,JPO&INPIT |
