| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma light source and a plasma light generating method that achieve higher output of EUV light by substantially shortening an emission cooling time of excitation level at which EUV light in an effective wavelength region (nearby 13.5 nm) is emitted. <P>SOLUTION: Plasma 8 is confined in an axial direction by supplying a plasma medium 6 having a light emission line nearby 13.5 nm and an additive 7 having a light emission line nearby 13.5 nm and also having a shorter emission cooling time than the plasma medium to space between a pair of coaxial electrodes 11 and generating a tubular discharge 2 in between the pair of coaxial electrodes, and resonance energy transfer is caused in between ions of the plasma medium 6 excited in the plasma 8 and ions of the additive 7 which is not excited, thereby emitting EUV light nearby 13.5 nm from both the plasma medium 6 and the additive 7. <P>COPYRIGHT: (C)2012,JPO&INPIT |
