发明名称 INTEGRATED CIRCUIT SYSTEM EMPLOYING RESISTANCE ALTERING TECHNIQUES
摘要 <p>INTEGRATED CIRCUIT SYSTEM EMPLOYING RESISTANCE ALTERING TECHNIQUESAn integrated circuit system that includes: providing a substrate including a firstregion and a second region; forming a first device over the first region and a resistance device over the second region; forming a first dielectric layer and a second dielectric layer over the substrate; removing a portion of the second dielectric layer; and annealing the integrated circuit system to remove dopant from the resistance device.FIG. 1</p>
申请公布号 SG174739(A1) 申请公布日期 2011.10.28
申请号 SG20110061371 申请日期 2009.02.27
申请人 GLOBALFOUNDRIES SINGAPORE PTE. LTD. 发明人 TAN SHYUE SENG;TEO LEE WEE;TAN CHUNG FOONG;LEE JAE GON;ELGIN QUEK KIOK BOONE
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