发明名称 |
INTEGRATED CIRCUIT SYSTEM EMPLOYING RESISTANCE ALTERING TECHNIQUES |
摘要 |
<p>INTEGRATED CIRCUIT SYSTEM EMPLOYING RESISTANCE ALTERING TECHNIQUESAn integrated circuit system that includes: providing a substrate including a firstregion and a second region; forming a first device over the first region and a resistance device over the second region; forming a first dielectric layer and a second dielectric layer over the substrate; removing a portion of the second dielectric layer; and annealing the integrated circuit system to remove dopant from the resistance device.FIG. 1</p> |
申请公布号 |
SG174739(A1) |
申请公布日期 |
2011.10.28 |
申请号 |
SG20110061371 |
申请日期 |
2009.02.27 |
申请人 |
GLOBALFOUNDRIES SINGAPORE PTE. LTD. |
发明人 |
TAN SHYUE SENG;TEO LEE WEE;TAN CHUNG FOONG;LEE JAE GON;ELGIN QUEK KIOK BOONE |
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