发明名称 PHOTOSENSITIVE NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive negative-working lithographic printing plate having high sensitivity, an excellent storage property under high humidity conditions and excellent ink receptivity. <P>SOLUTION: The photosensitive negative-working lithographic printing plate includes a hydrophilic layer, a photosensitive layer containing a photosensitive polymer and an overcoat layer at least in this order on a plastic film support where the overcoat layer contains polyvinyl alcohol and dextrin. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011186338(A) 申请公布日期 2011.09.22
申请号 JP20100053812 申请日期 2010.03.10
申请人 MITSUBISHI PAPER MILLS LTD 发明人 SEIYAMA HIDEO
分类号 G03F7/11;C08J7/04;G03F7/00;G03F7/028;G03F7/038;G03F7/09 主分类号 G03F7/11
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