METHOD FOR CHEMICAL VAPOR DEPOSITION

摘要

PURPOSE: A method for chemical vapor deposition is provided to improve a process efficiency by performing a process requiring a long time in a plurality of reaction chambers and increasing the operation efficiency of the reaction chamber. CONSTITUTION: In a method for chemical vapor deposition, a reaction chamber(100) includes first to sixth reaction chambers(110-160). A process of growing an active layer in the first reaction chamber and the second reaction chamber is performed. A cooling process is performed in the third reaction chamber A robot arm(350) loads a susceptor into a buffer chamber. The buffer chamber is provided to prevent the degradation of the thin film due to sudden temperature change.