The present invention is directed to dual phase and single phase depilatory compositions and methods of using said compositions. More specifically, the present invention is directed to a dual phase composition for the removal of hair comprising a first acidic phase containing a thiol-based depilatory agent and a second alkaline phase containing a pH buffer. The present invention is also directed to a single phase depilatory composition comprising 2-aminoehtanethiol and a pH buffer and an advantageous packaging means for said single phase depilatory composition.
