<p>A fluid conveyance system for thin film material deposition is provided. A first fluid distribution manifold (10) includes an output face (36) that includes a plurality of elongated slots. The plurality of elongated slots, include a source slot and an exhaust slot. A gas source (28a-28c) is in fluid communication with the source slot. The gas source is configured to provide a gas to the output face of the distribution manifold. A gas receiving chamber (29a-29b) is in fluid communication with the exhaust slot. The gas receiving chamber is configured to collect the gas provided to the output face of the distribution manifold through the exhaust slot. A sensor (46) positioned to sense a parameter of the gas traveling from the gas source to the gas receiving chamber. A controller (56), connected in electrical communication with the sensor, is configured to modify an operating parameter of the conveyance system based on data received from the sensor.</p>
申请公布号
WO2011056359(A1)
申请公布日期
2011.05.12
申请号
WO2010US52222
申请日期
2010.10.12
申请人
EASTMAN KODAK COMPANY;KERR, ROGER, STANLEY;SUTTON, JAMES, EDWARD;LEVY, DAVID, HOWARD
发明人
KERR, ROGER, STANLEY;SUTTON, JAMES, EDWARD;LEVY, DAVID, HOWARD