发明名称 SCALABLE LEAD ZIRCONIUM TITANATE (PZT) THIN FILM MATERIAL AND DEPOSITION METHOD, AND FERROELECTRIC MEMORY DEVICE STRUCTURES COMPRISING SUCH THIN FILM MATERIAL
摘要 A novel lead zirconium titanate (PZT) material having unique properties and application for PZT thin film capacitors and ferroelectric capacitor structures, e.g., FeRAMs, employing such thin film material. The PZT material is scalable, being dimensionally scalable, pulse length scalable and/or E-field scalable in character, and is useful for ferroelectric capacitors over a wide range of thicknesses, e.g., from about 20 nanometers to about 150 nanometers, and a range of lateral dimensions extending to as low as 0.15 μm. Corresponding capacitor areas (i.e., lateral scaling) in a preferred embodiment are in the range of from about 104 to about 10−2 μm2. The scalable PZT material of the invention may be formed by liquid delivery MOCVD, without PZT film modification techniques such as acceptor doping or use of film modifiers (e.g., Nb, Ta, La, Sr, Ca and the like).
申请公布号 US2011097478(A1) 申请公布日期 2011.04.28
申请号 US20100978393 申请日期 2010.12.23
申请人 ADVANCED TECHNOLOGY MATERIALS, INC. 发明人 VAN BUSKIRK PETER C.;ROEDER JEFFREY F.;BILODEAU STEVEN M.;RUSSELL MICHAEL W.;JOHNSTON STEPHEN T.;VESTYCK DANIEL J.;BAUM THOMAS H.
分类号 H01G4/00;C04B35/472;C04B35/491;C23C16/06;C23C16/40;C23C16/448;H01B3/00;H01B3/12;H01G4/12;H01L21/314;H01L21/316;H01L21/3205;H01L21/768;H01L21/8242;H01L21/8246;H01L23/52;H01L23/522;H01L27/105;H01L27/115 主分类号 H01G4/00
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