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发明名称
ATOMIC LAYER DEPOSITION APPARATUS
摘要
申请公布号
KR101028407(B1)
申请公布日期
2011.04.13
申请号
KR20080135371
申请日期
2008.12.29
申请人
发明人
分类号
H01L21/205;C23C16/455
主分类号
H01L21/205
代理机构
代理人
主权项
地址
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