| 摘要 |
<p>The disclosure concerns a magnet arrangement (124a, 124b, 200) for a target backing tube (122a, 122b) for a rotatable target of a sputtering system (100), the magnet arrangement having a longitudinal axis and a circumferential direction around the longitudinal axis (X), and being adapted for an arrangement in a cylindrical backing tube, wherein the magnet arrangement comprises in a circumferential sequence: a first magnet element (210) extending in parallel to the longitudinal axis, a second magnet element (220) extending in parallel to the longitudinal axis, and a third magnet element (230) extending in parallel to the longitudinal axis, wherein each magnet element has a center axis extending in a radial direction, wherein the angular distance between the first and the third magnet elements, with respect to their center axis, is less than about 85 degrees. Further, the disclosure concerns a target backing tube (122a, 122b) for a rotatable target of a sputtering system, wherein the target backing tube has a longitudinal axis, wherein the target backing tube contains a magnet arrangement (124a, 124b, 200) according to one embodiment disclosed herein, wherein the longitudinal axis of the magnet arrangement corresponds to the longitudinal axis of the backing tube. Further, the disclosure concerns a cylindrical target assembly (120a, 120b) comprising a target backing tube (122a, 122b) according to one embodiment disclosed herein, and at least one target cylinder disposed around the target backing tube. Finally, the disclosure concerns a sputtering system (100) comprising a vacuum chamber (110) and at least one target backing tube according to one embodiment disclosed herein, wherein the target backing tube is disposed in the vacuum chamber.</p> |
