| 摘要 |
A coating/developing apparatus includes a first storage section that stores data comprising correlations of different pattern information units including at least a line width of the resist pattern, different values of a film thickness of the underlying film, and different light information profiles. The apparatus further includes a mechanism configured to use a film thickness distribution to obtain an estimated film thickness of the underlying film at a light-irradiation area on the surface of the substrate, and to check the estimated film thickness and a light information profile obtained at the light-irradiation area against the data to determine pattern information at the light-irradiation area.
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