发明名称 |
METHOD AND SYSTEM FOR MANUFACTURING NANOSTRUCTURES |
摘要 |
A method and a system for manufacturing two-dimensional and three-dimensional nanostructures and nanodevices are described, wherein the formation of the nanostructure (of the nanodevice) on a target substrate is made, at a millimetric or super-millimetric distance from the substrate, by the deposition of material emitted in the form of an atomic/molecular beam having a selected pattern corresponding, at an enlarged scale, to the desired pattern of the nanostructure (nanodevice). The projection of the patterned beam through a diaphragm, associated with the substrate at a micrometric or sub-micrometric distance and having at least one shaped aperture of nanometric size, brings about the formation of a nanostructure pattern which is a convolution of the patterned beam with the diaphragm aperture. |
申请公布号 |
EP2286000(A1) |
申请公布日期 |
2011.02.23 |
申请号 |
EP20090746254 |
申请日期 |
2009.05.14 |
申请人 |
CONSIGLIO NAZIONALE DELLE RICERCHE |
发明人 |
TORMEN, MASSIMO;GOTTER, ROBERTO;PRASCIOLU, MAURO |
分类号 |
C23C14/04;B81C1/00;B82B3/00;B82Y30/00;B82Y40/00 |
主分类号 |
C23C14/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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