EXPOSURE DEVICE, CLEANING METHOD AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an exposure device capable of suppressing occurrence of an exposure defect.SOLUTION: The exposure device exposes a substrate to exposure light through a first liquid. The exposure device includes: an optical member having a projection surface for projecting the exposure light; a predetermined member; a supply hole capable of supplying a second liquid for cleaning to a surface of the predetermined member; a recovery hole for recovering the second liquid from the surface of the predetermined member; and a shutter member arranged at a position opposite the supply hole when the second liquid is not supplied from the supply hole, the supply hole and recovery hole being different from each other.