HEAT TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATES,申请号EP19990911878-传众专利搜索

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发明名称	HEAT TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATES
摘要
申请公布号	EP0986826(B1)	申请公布日期	2010.12.29
申请号	EP19990911878	申请日期	1999.04.06
申请人	COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIESALTERNATIVES	发明人	MALEVILLE, CHRISTOPHE;BARGE, THIERRY;ASPAR, BERNARD;MORICEAU, HUBERT;AUBERTON-HERVE, ANDRE-JACQUES
分类号	H01L21/265;H01L21/324;H01L21/762;H01L21/02;H01L21/316;H01L21/322;H01L27/12	主分类号	H01L21/265
代理机构		代理人
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