发明名称 SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING METHOD, AND COMPUTER-READABLE STORAGING MEDIUM
摘要 PURPOSE: A substrate processing device, a substrate processing method, and a computer-readable storing medium are provided to reduce the manufacturing cost by reducing the amount of deionized water in use by recycling the drainage discharged from a treating part. CONSTITUTION: A processing unit(10) processes a substrate(W). The processing unit comprises a treatment bath(12) accepting a wafer and an overflow bath portion(14). A processing solution supply part(30) supplies the processing liquid to the processing unit. A first liquid chemical supplier supplies the first chemical to the processing unit.
申请公布号 KR20100132450(A) 申请公布日期 2010.12.17
申请号 KR20100052937 申请日期 2010.06.04
申请人 TOKYO ELECTRON LIMITED 发明人 SATO HIDEAKI
分类号 H01L21/304 主分类号 H01L21/304
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