发明名称 THIN-FILM TRANSISTOR SUBSTRATE, AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To increase the capacitance of an auxiliary capacitor formed on a substrate, and to prevent the fluctuation thereof. SOLUTION: When forming the semiconductor layers 13, 17 of a TFT substrate 1 provided with a TFT 4 and the auxiliary capacitor 5, IGZO whose main components are indium, gallium, zinc and oxygen is used. When manufacturing the TFT substrate 1, as processing for reducing the resistance of the auxiliary capacitor semiconductor layer 17, plasma processing is performed after forming a passivation layer 20 and before forming a pixel electrode 21. Thus, the auxiliary capacitor semiconductor layer 17 is made into a conductor, the capacitance of the auxiliary capacitor 5 is increased, and the capacitor fluctuation of the auxiliary capacitor 5 is prevented. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010243594(A) 申请公布日期 2010.10.28
申请号 JP20090089376 申请日期 2009.04.01
申请人 SHARP CORP 发明人 CHIKAMA YOSHIMASA;NAKAGAWA OKIFUMI;HARA TAKESHI;NISHIKI HIROHIKO
分类号 G02F1/1368;H01L21/336;H01L29/786 主分类号 G02F1/1368
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