发明名称 LIQUID SUPPLY MECHANISM AND LIQUID EJECTION DEVICE
摘要 PROBLEM TO BE SOLVED: To suppress settling of particles of a substance in liquid residing between a pump for supplying liquid and a pressure regulation valve in a liquid ejection device having the pressure regulating valve. SOLUTION: A liquid supply mechanism is adapted to supply liquid to a recording head having two liquid reserve chambers which are adjacent to each other and respectively reserve liquid and the pressure regulation valve that generates a communicating state or a non-communicating state between the two liquid reserve chambers depending on a pressure change of at least one of the two liquid reserve chambers. The liquid supply mechanism includes the pump for performing supplying or sucking of liquid, a check valve which is placed between the pump and the pressure regulating valve so as to prevent a liquid from flowing to the upstream side, and a volume variable section which is placed between the pump and the pressure regulating valve and has a variable volume. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010221538(A) 申请公布日期 2010.10.07
申请号 JP20090071654 申请日期 2009.03.24
申请人 SEIKO EPSON CORP 发明人 ITO HIROYUKI
分类号 B41J2/175 主分类号 B41J2/175
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