| 摘要 |
<P>PROBLEM TO BE SOLVED: To measure the thickness of a thin film while a plurality of thin films are stacked. Ž<P>SOLUTION: An apparatus for testing the thin film includes: a storage section 14, which selects at least two feature quantities from among spectral reflectance spectrum feature quantities which are influenced by film thickness fluctuation of at least one of a first transparent thin film and a second transparent thin film, and stores at least two feature quantity characteristics which associate each of the selected feature quantities with each of the film thickness of the first transparent thin film and that of the second transparent thin film; a light irradiating section 11, which irradiates a substrate S to be tested with white light from a transparent glass substrate side; a light receiving section 12, which receives reflection light from the substrate S to be tested; and a calculating section 15 which obtains an actual measurement value of each feature quantity stored in the storage section 14 from the spectral reflectance spectrum based on received reflection light, and the film thickness of the first transparent thin film and that of the second transparent thin film by using the obtained actual measurement values of the feature quantities and the feature quantity characteristics stored in the storage section 14. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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