| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polymeric compound useful as a basic component of a positive resist composition, and the positive resist composition containing the polymeric compound, and to provide a method for forming a resist pattern using the positive resist composition. <P>SOLUTION: The polymeric compound (A1) includes a structural unit (a0-1), represented by a (meth)acrylate structure having an ester group in a side chain, the ester group having a cyclic group containing -SO<SB>2</SB>- in the ring skeleton through a linking group; a structural unit (a0-2), represented by a (meth)acrylate structure including, as a side chain, an ester group having an acid dissociable group linked lengthwise with an ester through a linking group; and a structural unit (a1-0-1) represented by a (meth)acrylate structure having an acid dissociable group in a side chain. With respect to the combined total of all the structural units, the proportion of the structural unit (a0-1) is in the range of 10 to 40 mol%, the ration of the structural unit (a0-2) is in the range of 5 to 20 mol%, and the proportion of the structural unit (a1-0-1) is in the range of 10 to 55 mol%. <P>COPYRIGHT: (C)2010,JPO&INPIT |
