发明名称 Manufacturing method of magnetoresistive effect element
摘要 A manufacturing method of an MR element in which current flows in a direction perpendicular to layer planes, includes forming on a lower electrode layer an MR multi-layered film having a cap layer at a top thereof, forming a mask on the cap layer of the MR multi-layered film, patterning the MR multi-layered film by milling through the mask to form an MR multi-layered structure, forming a magnetic domain control bias layer by using a lift off method using the mask, after forming the magnetic domain control bias layer, forming an additional cap layer on the cap layer and a part of the magnetic domain control bias layer, planarizing a top surface of the additional cap layer and the magnetic domain control bias layer, and forming an upper electrode layer on the planarized top surface.
申请公布号 US7770284(B2) 申请公布日期 2010.08.10
申请号 US20070806224 申请日期 2007.05.30
申请人 TDK CORPORATION 发明人 OHTA NAOKI;KAGAMI TAKEO
分类号 G11B5/127;H04R31/00 主分类号 G11B5/127
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