| 摘要 |
<P>PROBLEM TO BE SOLVED: To detect minute defects with improved sensitivity by preventing pseudo-defects from occurring because of minute variations of a pattern to be inspected for a method of inspecting defects for comparing inspection and reference patterns. <P>SOLUTION: A method of inspecting defects includes: a process for acquiring images of inspection patterns; a process for detecting the contours of the inspection patterns from the images; a process for dividing the images into inspection and non-inspection regions with the detected contours as boundaries; and a process for detecting defects in the inspection patterns based on obtained density distribution by performing image processing for obtaining the density distribution of the images only to the inspection region. <P>COPYRIGHT: (C)2010,JPO&INPIT |
