发明名称 METHOD FOR PRODUCING GaAs SINGLE CRYSTAL
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for producing a GaAs single crystal for improving the yield of the acquisition number of wafers, by appropriately controlling the rotation number of a crucible and the pulling speed of a pulling shaft. Ž<P>SOLUTION: The crucible 5 storing a GaAs raw material and boron trioxide as a sealant is placed in a chamber 2 charged with inert gas. The crucible 5 is heated by a heater 8 to produce a GaAs melt 9 in the crucible 5. A seed crystal 7 attached to the lower end of a pulling shaft 3 is brought into contact with the GaAs melt 9 and the seed crystal 7 is pulled while rotating the crucible 5 to produce a GaAs single crystal 10. The rotation number n [rpm] of the crucible 5 and the pulling speed V [mm/h] of the pulling shaft 3 are controlled to satisfy 28≥n≥5.89e<SP>0.07V</SP>. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010163287(A) 申请公布日期 2010.07.29
申请号 JP20090004314 申请日期 2009.01.13
申请人 HITACHI CABLE LTD 发明人 YABUKI SHINJI
分类号 C30B29/42;C30B15/22;C30B27/02 主分类号 C30B29/42
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