METHOD OF PRODUCING SYNTHETIC QUARTZ GLASS MEMBER FOR OPTICS, AND SYNTHETIC QUARTZ GLASS MEMBER FOR OPTICS

摘要

PROBLEM TO BE SOLVED: To provide a synthetic quartz glass member for optics having high laser resistance, which can be favorably used as a material for a variety of parts for a semiconductor aligner, and a method of producing the same.

SOLUTION: The method of producing a synthetic glass member for optics comprises: a process (a) of making a porous base material by hydrolyzing a volatile silicon compound with oxyhydrogen flame, and depositing fine particles of silica on a heat resistant base substance; a process (b) of dehydration heating treatment step in a vacuum or in an inactive gas containing atmosphere; a process (c) of obtaining a transparent quartz glass by heating; a process (d) of removing striae by carrying out a zone melting rotation stirring treatment by flame heating; a process (e) of forming in a cylindrical column; a process (f) of removing an external layer by grinding top and bottom surfaces and a periphery surface of the quartz glass; a process (g) of once keeping the quartz glass at a temperature of not lower than a slow cooling point, and thereafter slowly cooling; and a process (h) of carrying out heat treatment in an atmosphere containing a hydrogen gas at a pressure range of 0.0098-0.98 MPa at a temperature of not higher than 723 K to permeate with hydrogen molecules.

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