发明名称 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING A BARRIER RIB OF PDP
摘要 PURPOSE: A negative photoresist resin composition for forming a PDP barrier rib, and a plasma display panel(PDP) including the barrier rib are provided to remove an unnecessary laminating process, and to prevent the reduction of the production efficiency. CONSTITUTION: A negative photoresist resin composition for forming a PDP barrier rib is capable of forming the barrier rib at the coating thickness of 5~10 micrometers. The negative photoresist resin composition contains 50~60wt% of modified epoxy acrylate resin marked with chemical formula 1, 10~20wt% of radical polymerization initiator containing more than one photopolymerization initiator, 10~20wt% of monomer with a radical polymerizable double bond within a molecule, 1~2wt% of antifoaming agent, 1~2wt% of leveling agent, and 10~30wt% of solvent.
申请公布号 KR20100074617(A) 申请公布日期 2010.07.02
申请号 KR20080133103 申请日期 2008.12.24
申请人 DONGWOO FINE-CHEM CO., LTD. 发明人 CHOI, HYUNG SUB;CHOI, YONG SEOK;MOON, SUNG BAE
分类号 G03F7/027;G03F7/028 主分类号 G03F7/027
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