SEMICONDUCTOR DEVICE, METHOD OF DESIGNING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DESIGN APPARATUS, AND PROGRAM

摘要

PROBLEM TO BE SOLVED: To prevent uneven heat distribution from occurring within a semiconductor substrate in a lamp annealing process. Ž

SOLUTION: A method of designing a semiconductor device includes: a step S10 of disposing impurity diffusion layer regions and an element isolation film on a semiconductor substrate; a step S20 of partitioning the semiconductor substrate into multiple areas in predetermined area units of 1 mm2or greater; a step S30 of calculating the area ratio T of an impurity diffusion layer region to the element isolation film in each of the multiple areas; a step S40 of selecting areas that have a calculated area ratio out of a reference range as areas to be corrected; and a step S50 of disposing a dummy impurity diffusion layer region in each of the areas to be corrected so that its area ratio T falls within the reference range. Ž

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