| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new curable composition for photo-imprint that can reduce defects of fine patterns formed on base substrates and is excellent in photo-curability. Ž<P>SOLUTION: The curable composition for photo-imprint contains a photopolymerizable monomer and a photopolymerization initiator, characterized in that it exhibits a static contact angle of 20 degree or less at 25°C at the time after 10 seconds from the drop of the composition (A) which has been formed by mixing all the components of the above composition, followed by agitating the resultant mixture at 500 rpm for one hour, and in that the light transmittance of the composition (A) at 450 nm is at least 60%. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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