| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a photomask with which service life of the photomask can be made longer by controlling oxidation of a light-shielding film so as to prevent degradation of the photomask by exposure, and to provide a photomask. <P>SOLUTION: The method for manufacturing the photomask includes: preparing a substrate; forming the light-shielding film on the substrate; nitriding the surface of the light-shielding film to form one of chromium nitride, titanium chromium nitride, titanium tungsten nitride, zirconium nitride and aluminum nitride by the nitriding process; and employing one of a plasma soft nitriding method, a gas oxynitridation method, an ion beam sputtering method and an arc ion plating method for the nitriding process. <P>COPYRIGHT: (C)2010,JPO&INPIT |
