| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an antireflection film having a low refractive index and high mar resistance. <P>SOLUTION: The antireflection film contains a layer obtained by curing a composition including a compound of formula (1) [wherein Y is a group represented by formula (2) (wherein X is hydrogen, fluorine, chlorine, a methyl group or a hydroxy group) or a vinyl group; L<SB>1</SB>is a group represented by formula (3) or formula (4); L<SB>2</SB>and L<SB>3</SB>are each a group represented by formula (5), formula (6) or formula (7); Rf<SB>1</SB>is a saturated perfluoroalkyl group; Rf<SB>2</SB>is a perfluoroalkyl group or fluorine; and Rf<SB>3</SB>is a perfluoroalkyl group or chlorine] and inorganic fine particles. <P>COPYRIGHT: (C)2010,JPO&INPIT |
