发明名称 METHOD AND APPARATUS FOR EXTENDED TEMPERATURE PYROMETRY
摘要 Embodiments of the invention are directed to methods and apparatus for rapid thermal processing of a substrate over an extended temperature range, including low temperatures. Systems and methods for using an extended temperature pyrometry system employing a transmitted radiation detector system are disclosed. Systems combining transmitted radiation detector systems and emitted radiation detector systems are also described.
申请公布号 WO2010025228(A2) 申请公布日期 2010.03.04
申请号 WO2009US55162 申请日期 2009.08.27
申请人 APPLIED MATERIALS, INC.;HUNTER, AARON, M.;LI, JIPING;RAMANUJAM, RAJESH, S.;HAW, THOMAS 发明人 HUNTER, AARON, M.;LI, JIPING;RAMANUJAM, RAJESH, S.
分类号 H01L21/324;H01L21/66 主分类号 H01L21/324
代理机构 代理人
主权项
地址