METHOD AND APPARATUS FOR EXTENDED TEMPERATURE PYROMETRY
摘要
Embodiments of the invention are directed to methods and apparatus for rapid thermal processing of a substrate over an extended temperature range, including low temperatures. Systems and methods for using an extended temperature pyrometry system employing a transmitted radiation detector system are disclosed. Systems combining transmitted radiation detector systems and emitted radiation detector systems are also described.
申请公布号
WO2010025228(A2)
申请公布日期
2010.03.04
申请号
WO2009US55162
申请日期
2009.08.27
申请人
APPLIED MATERIALS, INC.;HUNTER, AARON, M.;LI, JIPING;RAMANUJAM, RAJESH, S.;HAW, THOMAS
发明人
HUNTER, AARON, M.;LI, JIPING;RAMANUJAM, RAJESH, S.