| 摘要 |
The evaporation device comprises a process chamber for forming and maintaining a gas atmosphere, and/or an anode (6), a cylindrical shaped evaporating cathode arranged as target, an electric energy source (7) for creating an electric voltage between the anode and the cathode, and a magnetic field source (8) for producing magnetic field. The process chamber comprises an inlet (4) and an outlet (5) for the process gas. The electric energy source is arranged so that the target material of the cylindrical shaped cathode is transferable into a steam phase. The evaporation device comprises a process chamber for forming and maintaining a gas atmosphere, and/or an anode (6), a cylindrical shaped evaporating cathode arranged as target, an electric energy source (7) for generating an electric voltage between the anode and the cathode, and a magnetic field source (8) for producing magnetic field. The process chamber comprises an inlet (4) and an outlet (5) for the process gas. The evaporating cathode comprises target materials. The electric energy source is arranged so that the target material of the cylindrical shaped cathode is transferable into a steam phase by the electric energy source. A cylindrical shaped atomization cathode and a cylindrical shaped electric arc cathode are simultaneously arranged around a longitudinal axis in the process chamber. The magnetic field source is equipped in the interior of the atomization cathode and/or the electric arc cathode, and/or the atomization cathode and/or the electric arc cathode are rotatably arranged relative to the magnetic field source, which is a permanent magnet and/or an electro magnet. The position of the magnetic filed source is adjustable in the interior of the atomization cathode and/or the electric arc cathode in related to an axial position and/or a radial position and/or to a circumference direction. Independent claims are included for: (1) an evaporation source; and (2) a method for coating a substrate. |
