| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a metal oxide thin film having high film density and high film hardness, and a manufacturing method thereof with high film deposition rate. <P>SOLUTION: In the manufacturing method of the metal oxide thin film, the metal oxide thin film is formed on a base material when reactive gas becomes in a plasma state by applying the high frequency voltage between two electrodes facing each other and executing the discharge in a reactive space under the atmospheric pressure or under the pressure in a vicinity of the atmospheric pressure, and a base material is exposed to reactive gas in the plasma state. Acid having the acid dissociation constant pKa of ≤3.5 is introduced in the reactive space. <P>COPYRIGHT: (C)2010,JPO&INPIT |
