| 摘要 |
PROBLEM TO BE SOLVED: To provide a film thickness measuring method for a thin film capable of performing high-accuracy and quick measurement of the thickness of a thin film and detection of an abnormal value, using a simple constitution. SOLUTION: The film thickness measuring method uses an X-ray diffraction device to measure the film thickness of the uppermost layer of a test sample, and the method includes: a reference value measuring step for measuring film-thickness reference values of a standard sample by a film-thickness measuring method using a device other than the X-ray diffraction device; a calibration information creation step for creating, beforehand, calibration information 10, wherein feature values detected from an X-ray diffraction intensity distribution of the standard sample are correlated with the film-thickness reference values; a distribution acquisition step S100 for acquiring an X-ray diffraction intensity distribution of the test sample; a feature value detection step S101 for detecting a feature value from the X-ray diffraction intensity distribution acquired in the acquisition step S100; and a film thickness calculation step S106 for calculating the film thickness of the uppermost layer of the test sample, from the feature value detected in the detection step S101 and the calibration information 10. COPYRIGHT: (C)2010,JPO&INPIT
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