LOCAL DRY ETCHING APPARATUS AND LOCAL DRY ETCHING FABRICATION METHOD

摘要

A local dry etching apparatus includes a vacuum chamber, a single workpiece table, a plurality of discharge tubes, a raw material gas supply device for supplying a raw material gas to a selected discharge tube, a single electromagnetic wave oscillator capable of output adjustment, and waveguides provided with an electromagnetic wave switcher. A discharge tube selected from the plurality of discharge tubes to be irradiated with the electromagnetic wave is switched sequentially by the electromagnetic wave switcher.

主权项

1. A local dry etching apparatus comprising:
a vacuum chamber, a plurality of discharge tubes each having a nozzle opening in the vacuum chamber at the downstream side for injecting an active species gas converted into plasma, a single workpiece table which mounts a workpiece thereon and is disposed in the vacuum chamber to the injection destination of the active species gas from the nozzle, a control device for controlling planar movement of the workpiece table, a raw material gas supply device for supplying a raw material gas as the raw material for the active species gas to a discharge tube selected from the plurality of the discharge tubes, a single electromagnetic wave oscillator capable of output adjustment, plasma generation portions each forming a part of the plurality of the discharge tubes where the raw material gas is converted into plasma to form an active species gas by irradiation of an electromagnetic wave oscillated by the single electromagnetic wave oscillator, and an electromagnetic wave transmission unit comprising an electromagnetic wave switcher for switching the path of the electromagnetic wave in order to irradiate the electromagnetic wave oscillated by the single electromagnetic wave oscillator to the plasma generation portion of the discharge tube selected from the plurality of the discharge tubes for the supply of the raw material gas.