发明名称 |
SEMICONDUCTOR MANUFACTURING APPARATUS |
摘要 |
Provided is a semiconductor manufacturing apparatus, which is capable of realizing fine-pitch patterns and thus improving stabilization of patterning precision. The semiconductor manufacturing apparatus comprises: a photoresist processing unit for forming a photoresist pattern in a predetermined region on a substrate to which a predetermined process is applied; and a substrate processing unit for forming a thin film on the surface of at least the photoresist pattern.
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申请公布号 |
US2009277382(A1) |
申请公布日期 |
2009.11.12 |
申请号 |
US20090406728 |
申请日期 |
2009.03.18 |
申请人 |
HITACHI-KOKUSAI ELECTRIC INC. |
发明人 |
MIZUNO NORIKAZU;KANAYAMA KENJI;OKUDA KAZUYUKI;HIROSE YOSHIRO;ASAI MASAYUKI |
分类号 |
C23C16/42 |
主分类号 |
C23C16/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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